{"id":25,"date":"2021-09-06T15:36:44","date_gmt":"2021-09-06T06:36:44","guid":{"rendered":"https:\/\/ie.unist.ac.kr\/new\/?page_id=25"},"modified":"2025-04-21T09:28:10","modified_gmt":"2025-04-21T00:28:10","slug":"ucrf","status":"publish","type":"page","link":"https:\/\/se.unist.ac.kr\/eng\/ucrf\/","title":{"rendered":"Research Equipment"},"content":{"rendered":"[vc_row row_type=&#8221;section&#8221; type=&#8221;grid&#8221; text_align=&#8221;left&#8221; video=&#8221;&#8221; el_class=&#8221;page_submenu&#8221;][vc_column][vc_column_text]\n<ul class=\"submenu\">\n<li><a href=\"\/eng\/ucrf\/\"><strong>Research Equipment<\/strong><\/a><\/li>\n<li><a href=\"\/eng\/fust\/\">Future Semiconductor Research Center<\/a><\/li>\n<\/ul>\n[\/vc_column_text][\/vc_column][\/vc_row][vc_row row_type=&#8221;section&#8221; type=&#8221;grid&#8221; text_align=&#8221;left&#8221; video=&#8221;&#8221; el_class=&#8221;page_ucrf&#8221;][vc_column][vc_column_text]\n<p class=\"page_txt_big fc_blue ta_c bar_bt\">UNIST Graduate School of Semiconductor Materials and Devices Engineering has specialized research equipment essential for research in each field.<\/p>\n[\/vc_column_text][vc_tabs style=&#8221;horizontal&#8221; el_class=&#8221;tab_st&#8221;][vc_tab title=&#8221;Nano Fabrication Center&#8221; tab_id=&#8221;1741701876218-3-7&#8243;][vc_row_inner row_type=&#8221;row&#8221; text_align=&#8221;left&#8221; css_animation=&#8221;&#8221; el_class=&#8221;tabcont01 box box01&#8243;][vc_column_inner width=&#8221;1\/2&#8243;][vc_column_text]\n<p class=\"txt1\">UNIST Nano Fabrication Center<\/p>\n<ul class=\"bul_cir gray\">\n<li>Clean room: Special closed space for manufacturing semiconductor\/sensor device (maintenance of temperature and humidity, control of cleanliness)<\/li>\n<li>It possesses Class 100 &amp; 1,000 (Class N refers to the number of particles of dust not exceeding N per square foot<\/li>\n<\/ul>\n[\/vc_column_text][\/vc_column_inner][vc_column_inner width=&#8221;1\/2&#8243;][vc_gallery interval=&#8221;3&#8243; images=&#8221;10686,10687,10688&#8243; img_size=&#8221;585 x 245&#8243; onclick=&#8221;&#8221; el_class=&#8221;slide_st&#8221;][\/vc_column_inner][\/vc_row_inner][vc_row_inner row_type=&#8221;row&#8221; text_align=&#8221;left&#8221; css_animation=&#8221;&#8221; el_class=&#8221;tabcont01 box box02&#8243;][vc_column_inner][vc_column_text]\n<h4 class=\"bul\">Status of Facilities<\/h4>\n<div class=\"tbl_scroll\">\n<table class=\"tbl_st1 type\">\n<colgroup>\n<col width=\"15%\" \/>\n<col width=\"15%\" \/>\n<col width=\"13%\" \/>\n<col width=\"\" \/> <\/colgroup>\n<thead>\n<tr>\n<th colspan=\"2\">Contents<\/th>\n<th colspan=\"2\">Details<\/th>\n<\/tr>\n<\/thead>\n<tbody>\n<tr>\n<td colspan=\"2\"><strong>Area \/ Class<\/strong><\/td>\n<td>1,000\u33a1 \/ 100<\/td>\n<td class=\"ta_l\">992\u33a1 vertical layers with multi-layer structure<br \/>\nYellow zone 100 class and White zone 1,000 class<\/td>\n<\/tr>\n<tr>\n<td rowspan=\"5\"><strong>Composition of Equipment(units)<\/strong><\/td>\n<td class=\"ta_l\"><strong>Photo<\/strong><\/td>\n<td>9<\/td>\n<td class=\"ta_l\">E-Beam lithography 1, Mask aligner 2, Nano imprint 1, Spin coater 3, 2 microscopes<\/td>\n<\/tr>\n<tr>\n<td class=\"ta_l\"><strong>Thinfilm<\/strong><\/td>\n<td>14<\/td>\n<td class=\"ta_l\">Furnace 2, ALD 2, Evaporator 2, LP CVD 1, PE CVD 2, Sputter 2 &amp; etc<\/td>\n<\/tr>\n<tr>\n<td class=\"ta_l\"><strong>Etch<\/strong><\/td>\n<td>11<\/td>\n<td class=\"ta_l\">Deep RIE 1, RIE 2, ICP 2, Asher 1, Wet Station 5<\/td>\n<\/tr>\n<tr>\n<td class=\"ta_l\"><strong>Inspection &amp; etc<\/strong><\/td>\n<td>10<\/td>\n<td class=\"ta_l\">SEM, Ellipsometer, Profiler, Dicing saw, Bonder, etc<\/td>\n<\/tr>\n<tr>\n<td class=\"ta_l\"><strong>Total<\/strong><\/td>\n<td>44<\/td>\n<td class=\"ta_l\">Capable of one-stop fabrication of multi-layer devices, etc.<\/td>\n<\/tr>\n<tr>\n<td colspan=\"2\"><strong>Number of processes \/ rate of operation<\/strong><\/td>\n<td>15,000 cases \/ 46%<\/td>\n<td class=\"ta_l\">It supported more than 15,000 cases of process a year on the basic of unit process with the rate of operation of 46% for the clean room<\/td>\n<\/tr>\n<tr>\n<td colspan=\"2\"><strong>Area \/ Class<\/strong><\/td>\n<td>Establishment of new fabrication<\/td>\n<td class=\"ta_l\">Opening of new fabrication in jan. 2017 after two-fold expansion of its capacity, structure of vertical layers<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n[\/vc_column_text][\/vc_column_inner][\/vc_row_inner][vc_row_inner row_type=&#8221;row&#8221; text_align=&#8221;left&#8221; css_animation=&#8221;&#8221; el_class=&#8221;tabcont01 box box03 display_grid&#8221;][vc_column_inner width=&#8221;1\/5&#8243;][vc_column_text]<strong>Lithography process<\/strong><br \/>\nTotal process of forming MEMS\/NEMS patterns and lift-off<\/p>\n<p><img loading=\"lazy\" decoding=\"async\" class=\"alignnone size-full wp-image-11188\" src=\"https:\/\/se.unist.ac.kr\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab01_img01.jpg\" alt=\"\" width=\"165\" height=\"195\" \/>[\/vc_column_text][\/vc_column_inner][vc_column_inner width=&#8221;2\/5&#8243;][vc_column_text]<strong>Thin film deposition and etching process<\/strong><br \/>\nFormation of the structure for deposition and dry etching of insulating nonmetallic thin film (oxide film, nitride film, dielectric thin film, etc.)<\/p>\n<p><img loading=\"lazy\" decoding=\"async\" class=\"alignnone size-full wp-image-11189\" src=\"https:\/\/se.unist.ac.kr\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab01_img02.jpg\" alt=\"\" width=\"337\" height=\"195\" \/>[\/vc_column_text][\/vc_column_inner][vc_column_inner width=&#8221;1\/5&#8243;][vc_column_text]<strong>Measurement of characteristics of device<\/strong><br \/>\nExperiment for measurement and analysis of contact \/ non-contact \/ electric characteristics \/ images by self-fabricated specimens<\/p>\n<p><img loading=\"lazy\" decoding=\"async\" class=\"alignnone size-full wp-image-11190\" src=\"https:\/\/se.unist.ac.kr\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab01_img03.jpg\" alt=\"\" width=\"165\" height=\"195\" \/>[\/vc_column_text][\/vc_column_inner][vc_column_inner width=&#8221;1\/5&#8243;][vc_column_text]<strong>Wet cleaning process<\/strong><br \/>\nCleaning and wet etching of the surface of specimens using chemicals<\/p>\n<p><img loading=\"lazy\" decoding=\"async\" class=\"alignnone size-full wp-image-11191\" src=\"https:\/\/se.unist.ac.kr\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab01_img04.jpg\" alt=\"\" width=\"165\" height=\"195\" \/>[\/vc_column_text][\/vc_column_inner][\/vc_row_inner][vc_row_inner row_type=&#8221;row&#8221; text_align=&#8221;left&#8221; css_animation=&#8221;&#8221; el_class=&#8221;tabcont01 box box04&#8243;][vc_column_inner][vc_column_text]\n<div class=\"swiper slider_ucrf\">\n<div class=\"swiper-wrapper\">\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab01_slide02_1.jpg\" alt=\"\" \/>Smock Room<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab01_slide02_2.jpg\" alt=\"\" \/>Hallway<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab01_slide02_3.jpg\" alt=\"\" \/>Wet Station<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab01_slide02_4.jpg\" alt=\"\" \/>Yellow room<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab01_slide02_5.jpg\" alt=\"\" \/>E-beam litho. room<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab01_slide02_6.jpg\" alt=\"\" \/>White room#1<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab01_slide02_7.jpg\" alt=\"\" \/>White room#2<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab01_slide02_8.jpg\" alt=\"\" \/>White room#3<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab01_slide02_9.jpg\" alt=\"\" \/>Diffusion room<\/div>\n<\/div>\n<div class=\"slider_ucrf_btns\">\n<div class=\"swiper-button-next\"><\/div>\n<div class=\"swiper-button-prev\"><\/div>\n<\/div>\n<\/div>\n[\/vc_column_text][\/vc_column_inner][\/vc_row_inner][\/vc_tab][vc_tab title=&#8221;Materials Characterization Lab&#8221; tab_id=&#8221;d1a5e360-abed-5&#8243;][vc_row_inner row_type=&#8221;row&#8221; text_align=&#8221;left&#8221; css_animation=&#8221;&#8221; el_class=&#8221;tabcont02 box box01&#8243;][vc_column_inner width=&#8221;1\/2&#8243;][vc_column_text]\n<p class=\"txt1\">UNIST Materials Characterization Lab<\/p>\n<ul class=\"bul_cir gray\">\n<li>Equipped with the infrastucture for converged researches in which most advanced and expensive equipment are stacked, the center leads high-precision and high-resolution analysis techniques and supports development of new analysis techniques.<\/li>\n<\/ul>\n[\/vc_column_text][\/vc_column_inner][vc_column_inner width=&#8221;1\/2&#8243;][vc_gallery interval=&#8221;3&#8243; images=&#8221;10689,10690,10691&#8243; img_size=&#8221;585 x 245&#8243; onclick=&#8221;&#8221; el_class=&#8221;slide_st&#8221;][\/vc_column_inner][\/vc_row_inner][vc_row_inner row_type=&#8221;row&#8221; text_align=&#8221;left&#8221; css_animation=&#8221;&#8221; el_class=&#8221;tabcont02 box box02&#8243;][vc_column_inner][vc_column_text]\n<h4 class=\"bul\">Materials Characterization Lab<\/h4>\n<div class=\"tbl_scroll\">\n<table class=\"tbl_st1 type\">\n<colgroup>\n<col width=\"15%\" \/>\n<col width=\"16.4%\" \/>\n<col width=\"9%\" \/>\n<col width=\"\" \/> <\/colgroup>\n<thead>\n<tr>\n<th colspan=\"2\">Contents<\/th>\n<th colspan=\"2\">Details<\/th>\n<\/tr>\n<\/thead>\n<tbody>\n<tr>\n<td colspan=\"2\"><strong>Area (\u33a1)<\/strong><\/td>\n<td>2,061<\/td>\n<td class=\"ta_l\"><\/td>\n<\/tr>\n<tr>\n<td rowspan=\"6\"><strong>Composition of Equipment (units)<\/strong><\/td>\n<td class=\"ta_l\"><strong>Electron Microscopic Analysis Center<\/strong><\/td>\n<td>31<\/td>\n<td class=\"ta_l\">Advanced TEM, HR-TEM, CS-STEM, Normal-TEM, Bio-TEM, FE-TEM, FIB(3), SEM(5), Ultramicrotome(2), PECS, Electron microscope, equipment for pre-processing of specimens(14)<\/td>\n<\/tr>\n<tr>\n<td class=\"ta_l\"><strong>X-ray Analysis Center<\/strong><\/td>\n<td>6<\/td>\n<td class=\"ta_l\">HPXRD, NXRDX, HRXRD, HRPXRD, MPHPXRD, XRF<\/td>\n<\/tr>\n<tr>\n<td class=\"ta_l\"><strong>Thermal and Property Analysis Center<\/strong><\/td>\n<td>7<\/td>\n<td class=\"ta_l\">TGA, DMA, DSC, SDT, Seebeck Coefficient analyser, Dilatometry<\/td>\n<\/tr>\n<tr>\n<td class=\"ta_l\"><strong>Spectrometer Center<\/strong><\/td>\n<td>9<\/td>\n<td class=\"ta_l\">FT-NMR(2), Zeta Potential, FT-IR UV-Vis-NIR Microspectrometer, UV-Vis-NIR(2), AFM-Raman, Confocal Raman<\/td>\n<\/tr>\n<tr>\n<td class=\"ta_l\"><strong>Mass Spectrometer Center<\/strong><\/td>\n<td>8<\/td>\n<td class=\"ta_l\">MALDI-TOF\/TOF, GC\/MS\/MS, LC\/MS\/MS (ESI-MS), GPC-MALS, DART-HRMS, UPLC\/MS\/MS, EA(2)<\/td>\n<\/tr>\n<tr>\n<td class=\"ta_l\"><strong>Surface Analysis Center<\/strong><\/td>\n<td>7<\/td>\n<td class=\"ta_l\">TOF-SIMS, XPS, XPS (UPS), AFM (2), BET (2)<\/td>\n<\/tr>\n<tr>\n<td colspan=\"2\"><strong>Number of analysis \/ rate of operation<\/strong><\/td>\n<td class=\"ta_l\" colspan=\"2\">Total number of analyses: 41,501 cases (Internal: 37,987 + Outside companies: 3,421 + Outside individuals: 93) \/ Average rate of operation of research equipment: 95.7% (As of 2020)<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n[\/vc_column_text][\/vc_column_inner][\/vc_row_inner][vc_row_inner row_type=&#8221;row&#8221; text_align=&#8221;left&#8221; css_animation=&#8221;&#8221; el_class=&#8221;tabcont02 box box03 display_grid box_style&#8221;][vc_column_inner width=&#8221;1\/3&#8243;][vc_column_text]\n<div class=\"box_tit\">Surface analysis<\/div>\n<div class=\"box_cont\">\n<p class=\"fw_700 ta_c\">TOF\u2013SIMS, XPS, XPS\/UPS, AFM<\/p>\n<p>Analysis of composition, molecular structure and trace elements of surface 3D analysis through analysis of depth and distribution<\/p>\n<\/div>\n[\/vc_column_text][\/vc_column_inner][vc_column_inner width=&#8221;1\/3&#8243;][vc_column_text]\n<div class=\"box_tit\">Analysis with microscope<\/div>\n<div class=\"box_cont\">\n<p class=\"fw_700 ta_c\">TEM(5), SEM(4), FIB(2), Sample prep.<\/p>\n<p>Observation of nano-scale micro structure and electronic imaging with high sensitivity at the atomic level Analysis of diffraction patterns Fabrication of nano device Observation of nano-scale patterning and image<\/p>\n<\/div>\n[\/vc_column_text][\/vc_column_inner][vc_column_inner width=&#8221;1\/3&#8243;][vc_column_text]\n<div class=\"box_tit\">Mass spectrometry<\/div>\n<div class=\"box_cont\">\n<p class=\"fw_700 ta_c\">MALDI-TOF\/TOF, GC\/MS\/MS, LC\/MS\/MS, DART-MS, GPC-MALS, EA(2)<\/p>\n<p>Verification of the molecular weight of macro-oragnic molecules, Analysis of impurities and byproducts, Qualitative \/ quantitative analysis compounds<\/p>\n<\/div>\n[\/vc_column_text][\/vc_column_inner][\/vc_row_inner][vc_row_inner row_type=&#8221;row&#8221; text_align=&#8221;left&#8221; css_animation=&#8221;&#8221; el_class=&#8221;tabcont02 box box03 display_grid box_style&#8221;][vc_column_inner width=&#8221;1\/3&#8243;][vc_column_text]\n<div class=\"box_tit\">Spectral analysis<\/div>\n<div class=\"box_cont\">\n<p class=\"fw_700 ta_c\">NMR(2), FT-IR, Raman(2), UV-Vis-NIR(2), UV-Vis Microspectrometer, Fluorometer(3), Zeta sizer<\/p>\n<p>Training of talents having creative knowledge and entrepreneurship Converged education for new materials \/ chemistry \/ physics \/ machinery \/ infrastructure, etc.joint research project by general \/ industrial-academic students<\/p>\n<\/div>\n[\/vc_column_text][\/vc_column_inner][vc_column_inner width=&#8221;1\/3&#8243;][vc_column_text]\n<div class=\"box_tit\">X-ray analysis<\/div>\n<div class=\"box_cont\">\n<p class=\"fw_700 ta_c\">XRD(6), XRF<\/p>\n<p>Analysis of crystal structure, chemical composition, and physical characteristics of materials or thin films, Analysis of thickness, roughness and density of ultra-thin films and analysis of orientation of substrates and thin films<\/p>\n<\/div>\n[\/vc_column_text][\/vc_column_inner][vc_column_inner width=&#8221;1\/3&#8243;][vc_column_text]\n<div class=\"box_tit\">Thermal and property analysis<\/div>\n<div class=\"box_cont\">\n<p class=\"fw_700 ta_c\">Rheometer, thermoanalyzer (4), apparatus for measuring coefficient of thermal expansion, apparatus for measuring thermoelectric modules<\/p>\n<p>Measurement of pyrolysis, thermal stability, oxidation stability, glass transition temperature, specific heat, melting point, degree of crystallization, etc.<\/p>\n<\/div>\n[\/vc_column_text][\/vc_column_inner][\/vc_row_inner][vc_row_inner row_type=&#8221;row&#8221; text_align=&#8221;left&#8221; css_animation=&#8221;&#8221; el_class=&#8221;tabcont02 box box04&#8243;][vc_column_inner][vc_column_text]\n<div class=\"swiper slider_ucrf\">\n<div class=\"swiper-wrapper\">\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab02_slide02_1.jpg\" alt=\"\" \/>Aberration Correcting Transmission Electron Microscope Lab<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab02_slide02_2.jpg\" alt=\"\" \/>High Resolution Transmission Electron Microscope Lab<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab02_slide02_3.jpg\" alt=\"\" \/>Focused lon Beam Lab<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab02_slide02_4.jpg\" alt=\"\" \/>Scanning Electron Lab<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab02_slide02_5.jpg\" alt=\"\" \/>Nuclear Magnetic Resonance Spectroscope Lab<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab02_slide02_6.jpg\" alt=\"\" \/>Secondary lon Mass Spectrometer Lab<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab02_slide02_7.jpg\" alt=\"\" \/>X-ray Analysis Lab<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab02_slide02_8.jpg\" alt=\"\" \/>Integration Room 1<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab02_slide02_9.jpg\" alt=\"\" \/>Integration Room 2<\/div>\n<\/div>\n<div class=\"slider_ucrf_btns\">\n<div class=\"swiper-button-next\"><\/div>\n<div class=\"swiper-button-prev\"><\/div>\n<\/div>\n<\/div>\n[\/vc_column_text][\/vc_column_inner][\/vc_row_inner][\/vc_tab][vc_tab title=&#8221;Environmental Analysis Center&#8221; tab_id=&#8221;5545e0c2-753e-5&#8243;][vc_row_inner row_type=&#8221;row&#8221; text_align=&#8221;left&#8221; css_animation=&#8221;&#8221; el_class=&#8221;tabcont03 box box01&#8243;][vc_column_inner width=&#8221;1\/2&#8243;][vc_column_text]\n<p class=\"txt1\">UEAC : UNIST Environmental Analysis Center<\/p>\n<ul class=\"bul_cir gray\">\n<li>It supports work of national certified certification institutions (persistent organic pollutants measuring institutions and education and research work for top-class environmental analysis.)<\/li>\n<\/ul>\n[\/vc_column_text][\/vc_column_inner][vc_column_inner width=&#8221;1\/2&#8243;][vc_column_text]\n<div class=\"img_wrap\"><img loading=\"lazy\" decoding=\"async\" class=\"alignnone size-full\" src=\"https:\/\/se.unist.ac.kr\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab03_img01.jpg\" alt=\"\" width=\"279\" height=\"380\" \/><img loading=\"lazy\" decoding=\"async\" class=\"alignnone size-full\" src=\"https:\/\/se.unist.ac.kr\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab03_img02.jpg\" alt=\"\" width=\"280\" height=\"380\" \/><\/div>\n[\/vc_column_text][\/vc_column_inner][\/vc_row_inner][vc_row_inner row_type=&#8221;row&#8221; text_align=&#8221;left&#8221; css_animation=&#8221;&#8221; el_class=&#8221;tabcont03 box box02&#8243;][vc_column_inner][vc_column_text]\n<h4 class=\"bul\">Environmental Analysis Center<\/h4>\n<div class=\"tbl_scroll\">\n<table class=\"tbl_st1 type\">\n<colgroup>\n<col width=\"15%\" \/>\n<col width=\"15%\" \/>\n<col width=\"13%\" \/>\n<col width=\"\" \/> <\/colgroup>\n<thead>\n<tr>\n<th colspan=\"2\">Contents<\/th>\n<th colspan=\"2\">Details<\/th>\n<\/tr>\n<\/thead>\n<tbody>\n<tr>\n<td colspan=\"2\"><strong>Area<\/strong><\/td>\n<td>422 \u33a1<\/td>\n<td class=\"ta_l\">Environmental Analysis Center<br \/>\nNew Nonorganic Analysis Lab<\/td>\n<\/tr>\n<tr>\n<td rowspan=\"5\"><strong>Composition of Equipment<\/strong><\/td>\n<td class=\"ta_l\"><strong>Organic analysis<\/strong><\/td>\n<td>7<\/td>\n<td class=\"ta_l\">GC\/HRMS 3, LC\/MS\/MS, 2D GC\/tof-MS, GC\/MS, GC\/ECD<\/td>\n<\/tr>\n<tr>\n<td class=\"ta_l\"><strong>Inorganic analysis<\/strong><\/td>\n<td>4<\/td>\n<td class=\"ta_l\">CP-TQ-MS, ICP-OES 2, LIBS<\/td>\n<\/tr>\n<tr>\n<td class=\"ta_l\"><strong>Pretreatment<\/strong><\/td>\n<td>34<\/td>\n<td class=\"ta_l\">Rotary evaporator, Dry oven Heating mantle etc.<\/td>\n<\/tr>\n<tr>\n<td class=\"ta_l\"><strong>Sampling device<\/strong><\/td>\n<td>7<\/td>\n<td class=\"ta_l\">Stack sampler 2, Gas analyzer 2, High volume air sampler 3<\/td>\n<\/tr>\n<tr>\n<td class=\"ta_l\"><strong>Total<\/strong><\/td>\n<td>52<\/td>\n<td class=\"ta_l\">Capable of analyzing micro-volume impurities<\/td>\n<\/tr>\n<tr>\n<td colspan=\"2\"><strong>Number of analysis \/ rate of operation<\/strong><\/td>\n<td>1800 cases \/ 46.9%<\/td>\n<td class=\"ta_l\">It supported 1,800 cases of analysis with 46.9% rate of operation of equipment in 2020.<\/td>\n<\/tr>\n<tr>\n<td colspan=\"2\"><strong>Room class of the new Inorganic Analysis Lab<\/strong><\/td>\n<td>Under construction<\/td>\n<td class=\"ta_l\">Pre-processing room: 1000 class \/ Analysis Lab: 100 class<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n[\/vc_column_text][\/vc_column_inner][\/vc_row_inner][vc_row_inner row_type=&#8221;row&#8221; text_align=&#8221;left&#8221; css_animation=&#8221;&#8221; el_class=&#8221;tabcont03 box box03&#8243;][vc_column_inner][vc_column_text]\n<div class=\"swiper slider_ucrf\">\n<div class=\"swiper-wrapper\">\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab03_slide01_1.jpg\" alt=\"\" \/>GC\/HRMS Lab<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab03_slide01_2.jpg\" alt=\"\" \/>Organic Analysis Lab<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab03_slide01_3.jpg\" alt=\"\" \/>Inorganic Analysis Lab<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab03_slide01_4.jpg\" alt=\"\" \/>Pre-processing Room<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab03_slide01_5.jpg\" alt=\"\" \/>Pre-processing Room<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab03_slide01_6.jpg\" alt=\"\" \/>Inorganic Analysis Lab (100 class)<\/div>\n<div class=\"swiper-slide\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab03_slide01_7.jpg\" alt=\"\" \/>ICP-TQ-MS to be introduced(in 2021)<\/div>\n<\/div>\n<div class=\"slider_ucrf_btns\">\n<div class=\"swiper-button-next\"><\/div>\n<div class=\"swiper-button-prev\"><\/div>\n<\/div>\n<\/div>\n[\/vc_column_text][\/vc_column_inner][\/vc_row_inner][\/vc_tab][vc_tab title=&#8221;Synchrotron Radiation Research Center&#8221; tab_id=&#8221;1741701875099-2-10&#8243;][vc_row_inner row_type=&#8221;row&#8221; text_align=&#8221;left&#8221; css_animation=&#8221;&#8221; el_class=&#8221;tabcont04 box box01&#8243;][vc_column_inner width=&#8221;1\/2&#8243;][vc_column_text]\n<p class=\"txt1\">USRRL : UNIST Synchrotron Radiation Research Laboratory<\/p>\n<ul class=\"bul_cir gray\">\n<li>It supports diverse advanced researches leading basic sciences and development and researches of mext-generation energy materials, new drug materials, and next-generation display materials.<\/li>\n<\/ul>\n[\/vc_column_text][\/vc_column_inner][vc_column_inner width=&#8221;1\/2&#8243;][vc_column_text]<img loading=\"lazy\" decoding=\"async\" class=\"alignnone size-full wp-image-11248\" src=\"https:\/\/se.unist.ac.kr\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab04_img01.jpg\" alt=\"\" width=\"585\" height=\"204\" \/>[\/vc_column_text][\/vc_column_inner][\/vc_row_inner][vc_row_inner row_type=&#8221;row&#8221; text_align=&#8221;left&#8221; css_animation=&#8221;&#8221; el_class=&#8221;tabcont04 box box02&#8243;][vc_column_inner][vc_column_text]\n<h4 class=\"bul\">Conditions and Main Devices by Experiment Mode<\/h4>\n<div class=\"tbl_scroll\">\n<table class=\"tbl_st1 type\">\n<colgroup>\n<col width=\"16%\" \/>\n<col width=\"21%\" \/>\n<col width=\"21%\" \/>\n<col width=\"21%\" \/>\n<col width=\"21%\" \/> <\/colgroup>\n<thead>\n<tr>\n<th><\/th>\n<th>X-ray absorption<br \/>\nsepecroscopy XAFS<\/th>\n<th>(Grazing) Small-angle<br \/>\nX-ray scattering (GI) SAXS<\/th>\n<th>(Grazing) Small-angle<br \/>\nX-ray diffraction (GI) WAXD<\/th>\n<th>X-ray single crystal<br \/>\nCrystallography<\/th>\n<\/tr>\n<\/thead>\n<tbody>\n<tr>\n<td class=\"ta_l\"><strong>Light source \/ spectroscope \/ resolution(\u0394\u0395\/\u0395)<\/strong><\/td>\n<td colspan=\"4\">Bending magnet \/ Si(111) dual crystal spectroscope \/ ~2\u00d710\u207b\u2074<\/td>\n<\/tr>\n<tr>\n<td class=\"ta_l\"><strong>Focusing mirror system<\/strong><\/td>\n<td colspan=\"4\">Toroidal, bendable (Coating materials: Rh 5 nm, Pt 35 nm)<\/td>\n<\/tr>\n<tr>\n<td class=\"ta_l\"><strong>Scope of Beam power(photen\/s) \/ energy<\/strong><\/td>\n<td colspan=\"4\">2\u00d710\u00b9\u00b9 @10 keV \/ 520 keV<\/td>\n<\/tr>\n<tr>\n<td class=\"ta_l\"><strong>Beam size<\/strong><\/td>\n<td>(0.8 \u00d7 1.6) mm\u00b2<\/td>\n<td>(0.6 \u00d7 0.8) mm\u00b2<\/td>\n<td>(0.15 \u00d7 0.15) mm\u00b2<\/td>\n<td>(0.12 \u00d7 0.12) mm\u00b2<\/td>\n<\/tr>\n<tr>\n<td class=\"ta_l\"><strong>Main experiment system<\/strong><\/td>\n<td class=\"ta_l va_t\">\n<ul class=\"bul_dot\">\n<li>7-element Ge Fluorescence detection system<\/li>\n<li>I.C Spec PIPS Fluorescence detection system<\/li>\n<li>Battery charge and discharge regulator<\/li>\n<li>Multi-sample stage<\/li>\n<li>In-situ fuel cell and coin cell measuring device<\/li>\n<\/ul>\n<\/td>\n<td class=\"ta_l va_t\">\n<ul class=\"bul_dot\">\n<li>X-ray CCD detector (MX225-HS, Rayonix)<\/li>\n<li>GI-SAXS stage<\/li>\n<li>solution SAXS stage<\/li>\n<li>Penetrating high-temperature stage<\/li>\n<li>Penetrating multi-sample stage<\/li>\n<li>In-situ battery charge and discharge experiment system (for coin cells and pouch cells)<\/li>\n<\/ul>\n<\/td>\n<td class=\"ta_l va_t\">\n<ul class=\"bul_dot\">\n<li>X-ray CCD detector<\/li>\n<li>(GI)-WAXD stage (powder, film samples)<\/li>\n<li>High-temperature stage (450 \u2103 max.)<\/li>\n<li>Film tensile experiment system (200N max.)<\/li>\n<li>Penetrating multi-sample stage<\/li>\n<li>n-situ battery charge and discharge experiment system (for coin cells and pouch cells)<\/li>\n<li>Capillary high-temperature stage (500K max)<\/li>\n<\/ul>\n<\/td>\n<td class=\"ta_l va_t\">\n<ul class=\"bul_dot\">\n<li>X-ray CCD detector<\/li>\n<li>Triaxial goniometer<\/li>\n<li>HKL 2000 software<\/li>\n<li>Optical microscope<\/li>\n<li>Cryojet 5 (85K ~ 500K)<\/li>\n<li>Powder diffraction experiment (PXRD)<\/li>\n<\/ul>\n<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n[\/vc_column_text][\/vc_column_inner][\/vc_row_inner][vc_row_inner row_type=&#8221;row&#8221; text_align=&#8221;left&#8221; css_animation=&#8221;&#8221; el_class=&#8221;tabcont04 box box03&#8243;][vc_column_inner][vc_column_text]\n<h4 class=\"bul\">Composition of beam line<\/h4>\n<div class=\"img_list\">\n<div class=\"img_item\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab04_img02_1.jpg\" alt=\"\" \/>Entrance of 6D UNIST\u2013PAL Beamline<\/div>\n<div class=\"img_item\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab04_img02_2.jpg\" alt=\"\" \/>Data &amp; EPICS PC<\/div>\n<div class=\"img_item\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab04_img02_3.jpg\" alt=\"\" \/>HKL2000 PC &amp; Optical Microscopy<\/div>\n<div class=\"img_item\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab04_img02_4.jpg\" alt=\"\" \/>Experimental Hutch<\/div>\n<\/div>\n[\/vc_column_text][\/vc_column_inner][\/vc_row_inner][vc_row_inner row_type=&#8221;row&#8221; text_align=&#8221;left&#8221; css_animation=&#8221;&#8221; el_class=&#8221;tabcont04 box box04&#8243;][vc_column_inner][vc_column_text]\n<h4 class=\"bul\">Experimental mode<\/h4>\n<div class=\"img_list\">\n<div class=\"img_item\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab04_img02_5.jpg\" alt=\"\" \/>(GI)-WAXD modes<\/div>\n<div class=\"img_item\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab04_img02_6.jpg\" alt=\"\" \/>(GI)-SAXS modes<\/div>\n<div class=\"img_item\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab04_img02_7.jpg\" alt=\"\" \/>X-ray crystallography mode<\/div>\n<div class=\"img_item\"><img decoding=\"async\" src=\"\/eng\/wp-content\/uploads\/2025\/04\/ucrf_tab04_img02_8.jpg\" alt=\"\" \/>XAFS mode<\/div>\n<\/div>\n[\/vc_column_text][\/vc_column_inner][\/vc_row_inner][\/vc_tab][\/vc_tabs][\/vc_column][\/vc_row]\n","protected":false},"excerpt":{"rendered":"<p>[vc_row row_type=&#8221;section&#8221; type=&#8221;grid&#8221; text_align=&#8221;left&#8221; video=&#8221;&#8221; el_class=&#8221;page_submenu&#8221;][vc_column][vc_column_text] Research Equipment Future Semiconductor Research Center [\/vc_column_text][\/vc_column][\/vc_row][vc_row row_type=&#8221;section&#8221; type=&#8221;grid&#8221; text_align=&#8221;left&#8221; video=&#8221;&#8221; el_class=&#8221;page_ucrf&#8221;][vc_column][vc_column_text] UNIST Graduate School of Semiconductor Materials and Devices Engineering has specialized research equipment essential for research in each field. [\/vc_column_text][vc_tabs style=&#8221;horizontal&#8221; el_class=&#8221;tab_st&#8221;][vc_tab title=&#8221;Nano Fabrication Center&#8221; tab_id=&#8221;1741701876218-3-7&#8243;][vc_row_inner row_type=&#8221;row&#8221;&#8230;<\/p>\n","protected":false},"author":1,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"full_width.php","meta":{"footnotes":""},"_links":{"self":[{"href":"https:\/\/se.unist.ac.kr\/eng\/wp-json\/wp\/v2\/pages\/25"}],"collection":[{"href":"https:\/\/se.unist.ac.kr\/eng\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/se.unist.ac.kr\/eng\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/se.unist.ac.kr\/eng\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/se.unist.ac.kr\/eng\/wp-json\/wp\/v2\/comments?post=25"}],"version-history":[{"count":40,"href":"https:\/\/se.unist.ac.kr\/eng\/wp-json\/wp\/v2\/pages\/25\/revisions"}],"predecessor-version":[{"id":11495,"href":"https:\/\/se.unist.ac.kr\/eng\/wp-json\/wp\/v2\/pages\/25\/revisions\/11495"}],"wp:attachment":[{"href":"https:\/\/se.unist.ac.kr\/eng\/wp-json\/wp\/v2\/media?parent=25"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}